Saturday , October 23 2021

Difference between Wet and Dry Etching

Question: What is Etching? Write down the Difference between Wet and Dry Etching?

 

Solution:

Etching: Etching is a process that selectively removes unmasked portions of a layer. Simply etching is used to remove material from the wafer.

Difference between Wet and Dry Etching

Wet Etching

Dry Etching

Method

Chemical Solutions

Ion Bombardment or chemical Reactive

Environment and Equipment

Atmosphere, Bath

Vacuum Chamber

Advantage

i) Low cost, easy to implement

ii)High etching rate

iii)Good selectivity for most materials

i)Capable of defining small feature size (<100nm)

Disadvantage

i)Inadequate for defining feature size <1um

ii)Potential of chemical handling hazards

iii)Wafer contamination issues

i)High cost, hard to implement

ii)Low throughput

iii)Poor selectivity

iv)Potential radiation damage

Directionality

Isotropic (Except for etching crystalline materials)

Anisotropic

 

Read:Effects of O2 and H2 addition on etching rate

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