Typical Radio-Frequency Plasma Discharge System
A typical Radiofrequency plasma discharge system is shown in the figure below.
It involves a voltage source that flows current through a low-pressure gas between two parallel conducting plates. The gas breaks down to form typical plasma, a usually weakly ionized plasma is formed between the electrodes.
The process chamber can be surrounded by dc multipole magnetic fields to improve plasma confinement near the chamber surfaces.
While providing a magnetic near-field, free plasma atmosphere creates at the wafer. Such arrangements are often called remote sources.